E-Beam System

Raith-Vistec EBPG 5HR


  • Electron Source: FEG (Field Emission Gun)
  • Beam energy: up to 100keV
  • Beam diameter: 8 nm
  • Minimum exposed feature: 20 nm
  • Maximum substrate size: 6 inches
  • 10 MHz frequency
  • Block size 560mm
  • Laser interferometer (l/120 ~5nm)
  • Hight sensor
  • Overlay accuracy <20nm
  • Direct writing (up to 4”)
  • Mask fabrication (up to 4”)